We have introduced 6-inch CVD diamond Blank, utilizing high-power 915MHz microwave plasma chemical vapor deposition (MPCVD) technology. This process ionizes carbon-containing gases (such as methane) and hydrogen through microwaves, enabling the deposition of carbon ions onto substrates such as diamond, silicon, or molybdenum plates. This results in the homoepitaxial or heteroepitaxial growth of high-purity single-crystal or large-area polycrystalline diamond films.
Through our proprietary digital control software, we can precisely quantify and adjust the growth conditions of diamond, allowing for the scalable production of single-crystal or polycrystalline diamonds with various specifications and parameters.
Our Advantages:
Higher thermal conductivity & minimal contamination: Our process minimizes contamination sources within the chamber, leading to lower metal contamination, higher purity, and uniform surface granularity. The thermal conductivity of our diamond surpasses that of other fabrication methods.
Higher production efficiency: The output per unit of our 915MHz equipment is 3-4 times that of conventional 2.45GHz systems, enabling a cost-effective adaptation to downstream applications and reducing the overall manufacturing cost of diamond-based devices.
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